Title:
ILLUMINATION SYSTEM WITH CURVED 1D-PATTERNED MASK FOR USE IN EUV-EXPOSURE TOOL
Document Type and Number:
WIPO Patent Application WO/2018/208912
Kind Code:
A3
Abstract:
A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of two optical reflectors disposed sequentially to transfer EUV radiation incident onto the first optical component to the pattern-source the substantially one-dimensional pattern of which is disposed in a curved surface. In one case, such combination includes only two optical reflectors (each may contain multiple constituent components). The combination is disposed in a fixed spatial and optical relationship with respect to the pattern-source, and represents an illumination unit (IU) of a ID EUV exposure tool that additionally includes (includes a projection optical sub-system configured to form an optical image of the pattern-source on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.
Inventors:
SMITH DANIEL (US)
WILLIAMSON DAVID (US)
FLAGELLO DONIS (US)
BINNARD MICHAEL (US)
WILLIAMSON DAVID (US)
FLAGELLO DONIS (US)
BINNARD MICHAEL (US)
Application Number:
PCT/US2018/031796
Publication Date:
January 24, 2019
Filing Date:
May 09, 2018
Export Citation:
Assignee:
NIKON CORP (JP)
SMITH DANIEL GENE (US)
WILLIAMSON DAVID M (US)
FLAGELLO DONIS G (US)
BINNARD MICHAEL B (US)
SMITH DANIEL GENE (US)
WILLIAMSON DAVID M (US)
FLAGELLO DONIS G (US)
BINNARD MICHAEL B (US)
International Classes:
G03F7/20; G02B17/06; G21K1/06
Foreign References:
| US20140268086A1 | 2014-09-18 | |||
| US5212588A | 1993-05-18 | |||
| JP2001027699A | 2001-01-30 | |||
| US5003567A | 1991-03-26 | |||
| US20160313646A1 | 2016-10-27 | |||
| US20040256575A1 | 2004-12-23 |
Attorney, Agent or Firm:
SIDORIN, Yakov, S. (US)
Download PDF: