Title:
ILLUMINATION SYSTEM WITH FLAT 1D-PATTERNED MASK FOR USE IN EUV-EXPOSURE TOOL
Document Type and Number:
WIPO Patent Application WO/2018/200536
Kind Code:
A3
Abstract:
A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of only three optical components disposed sequentially to transfer EUV radiation incident the first optical component onto the pattern-source. The combination is disposed in a fixed spatial and optical relationship with respect to the patternsource, and represents an illumination unit (IU) of a 1D EUV exposure tool that additionally includes |includes a projection optic sub-system configured to form an optical image of the patternsource on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.
Inventors:
SMITH DANIEL (US)
WILLIAMSON DAVID (US)
WILLIAMSON DAVID (US)
Application Number:
PCT/US2018/029160
Publication Date:
December 06, 2018
Filing Date:
April 24, 2018
Export Citation:
Assignee:
NIKON CORP (JP)
SMITH DANIEL GENE (US)
WILLIAMSON DAVID M (US)
SMITH DANIEL GENE (US)
WILLIAMSON DAVID M (US)
International Classes:
G03F7/20; G02B17/06; G21K1/06
Domestic Patent References:
| WO2017199096A1 | 2017-11-23 |
Foreign References:
| US20140268086A1 | 2014-09-18 | |||
| US5212588A | 1993-05-18 |
Other References:
CEGLIO N M ET AL: "FRONT-END DESIGN ISSUES IN SOFT-X-RAY PROJECTION LITHOGRAPHY", APPLIED OPTICS, OPTICAL SOCIETY OF AMERICA, WASHINGTON, DC; US, vol. 32, no. 34, 1 December 1993 (1993-12-01), pages 7050 - 7056, XP000414608, ISSN: 0003-6935, DOI: 10.1364/AO.32.007050
Attorney, Agent or Firm:
SIDORIN, Yakov, S. (US)
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