IMAGE CAPTURE ELEMENT, MANUFACTURING METHOD, AND ELECTRONIC DEVICE

WIPO Patent Application WO/2018/131509

A1

The present disclosure relates to an image capture element for capturing an image with improved image quality, a manufacturing method, and an electronic device. In an effective pixel region in which a plurality of pixels are arranged in a matrix, a plurality of microlenses are formed to collect light on a pixel by pixel basis. In an effective pixel peripheral region disposed so as to surround the outer side of the effective pixel region, a plurality of slit-type optical diffraction gratings are formed, with a longitudinal direction thereof extending in a direction orthogonal to a side direction of the effective pixel region. The microlenses and the slit-type optical diffraction gratings are coated with antireflection coating. The present technique may be applied in a CMOS image sensor, for example.

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OOTSUKA YOICHI (JP)

PCT/JP2017/047264

July 19, 2018

December 28, 2017

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SONY SEMICONDUCTOR SOLUTIONS CORP (JP)

H01L27/146; G02B3/00; G02B5/18; H04N5/369

JP2010212635A	2010-09-24
JP2011146481A	2011-07-28
JP2013012518A	2013-01-17
JP2010186818A	2010-08-26
JP2008287747A	2008-11-27
US20120224263A1	2012-09-06
JP2014207253A	2014-10-30
JP2008304855A	2008-12-18

NISHIKAWA Takashi et al. (JP)

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