Title:
IMAGING ELEMENT, MANUFACTURING METHOD OF IMAGING ELEMENT, METAL THIN FILM FILTER, AND ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/110570
Kind Code:
A1
Abstract:
According to some aspects, an imaging device is provided comprising a photoelectric conversion layer configured to receive light and to produce an electric charge in response to the received light, including a first filter region corresponding to a first pixel of the imaging device, the first filter region having a first thickness and a plurality of through holes formed therein, wherein the first filter region transmits light incident on the first filter region with a first peak transmission wavelength, and a second filter region corresponding to a second pixel of the imaging device, the second filter region having a second thickness greater than the first thickness and having a plurality of through holes formed therein, wherein the second filter region transmits light incident on the second filter region with a second peak transmission wavelength that is greater than the first peak transmission wavelength.
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Inventors:
SUGIZAKI TARO (JP)
Application Number:
PCT/JP2017/044626
Publication Date:
June 21, 2018
Filing Date:
December 12, 2017
Export Citation:
Assignee:
SONY SEMICONDUCTOR SOLUTIONS CORP (JP)
International Classes:
H01L27/146
Domestic Patent References:
WO2009011439A1 | 2009-01-22 | |||
WO2016016635A1 | 2016-02-04 |
Foreign References:
US20100059663A1 | 2010-03-11 | |||
US20050103983A1 | 2005-05-19 | |||
JP2010165718A | 2010-07-29 |
Attorney, Agent or Firm:
NISHIKAWA Takashi et al. (JP)
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