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Patent Searching and Data


Title:
IMAGING ELEMENT AND METHOD FOR PRODUCING IMAGING ELEMENT
Document Type and Number:
WIPO Patent Application WO/2019/171787
Kind Code:
A1
Abstract:
The present invention reduces reflection of incident light in an imaging element wherein a transparent resin is arranged on the surface of a microlens. An imaging element according to the present invention is provided with a pixel, a microlens, a transparent resin layer and a sealing glass. The pixel is formed on a semiconductor substrate, and produces an image signal that corresponds to the light irradiated thereon. The microlens is arranged adjacent to the pixel, and focuses incident light on the pixel, while planarizing the surface of the pixel. The transparent resin layer is arranged adjacent to the microlens, and is configured to have a refractive index that is different from the refractive index of the microlens by a predetermined value. The sealing glass is arranged adjacent to the transparent resin, and seals the semiconductor substrate.

Inventors:
SHIBAYAMA Toshikazu (4000-1 Oaza-Haramizu, Kikuyo-machi Kikuchi-gu, Kumamoto 02, 〒8691102, JP)
MORIYA Yusuke (4000-1 Oaza-Haramizu, Kikuyo-machi Kikuchi-gu, Kumamoto 02, 〒8691102, JP)
MITSUNAGA Nobuyuki (4000-1 Oaza-Haramizu, Kikuyo-machi Kikuchi-gu, Kumamoto 02, 〒8691102, JP)
Application Number:
JP2019/001598
Publication Date:
September 12, 2019
Filing Date:
January 21, 2019
Export Citation:
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Assignee:
SONY SEMICONDUCTOR SOLUTIONS CORPORATION (4-14-1 Asahi-cho, Atsugi-shi Kanagawa, 14, 〒2430014, JP)
International Classes:
H01L27/146; H04N5/369
Domestic Patent References:
WO2014141991A12014-09-18
WO2017073440A12017-05-04
Foreign References:
JP2016115706A2016-06-23
JPH10270672A1998-10-09
JP2003037257A2003-02-07
Attorney, Agent or Firm:
MATSUO Kenichiro (7th Floor, Shinkumi Akasaka Bldg. 10-17, Akasaka 1-chome, Chuo-ku, Fukuoka-sh, Fukuoka 42, 〒8100042, JP)
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