Title:
IMAGING OPTICAL SYSTEM FOR A METROLOGY SYSTEM FOR ANALYZING A LITHOGRAPHY MASK
Document Type and Number:
WIPO Patent Application WO/2016/012425
Kind Code:
A3
Abstract:
The invention relates to an imaging optical system (40) which is used to analyze a lithography mask within a metrology system. Said lithography mask can be arranged in an object field (3) of the imaging optical system. Said object field (3) is defined by two object field coordinates (x, y) which are mutually perpendicular. The imaging optical system (40) comprises an aperture diaphragm (42), the aspect ratio thereof in the direction of both object field coordinates is different by 1. As a result, an imaging optical system which can be used to analyze lithography masks which are designed for projection lithography by means of an anamorphotic projection optical system is obtained.
Inventors:
RUOFF JOHANNES (DE)
MÜLLER RALF (DE)
BEDER SUSANNE (DE)
MATEJKA ULRICH (DE)
MANN HANS-JÜRGEN (DE)
NEUMANN JENS TIMO (DE)
MÜLLER RALF (DE)
BEDER SUSANNE (DE)
MATEJKA ULRICH (DE)
MANN HANS-JÜRGEN (DE)
NEUMANN JENS TIMO (DE)
Application Number:
PCT/EP2015/066604
Publication Date:
May 19, 2016
Filing Date:
July 21, 2015
Export Citation:
Assignee:
ZEISS CARL SMT GMBH (DE)
International Classes:
G02B17/08; G02B5/00
Foreign References:
| DE102011084255A1 | 2012-05-24 | |||
| US20120127566A1 | 2012-05-24 | |||
| US20060012767A1 | 2006-01-19 | |||
| EP2506061A1 | 2012-10-03 | |||
| US20070188729A1 | 2007-08-16 |
Attorney, Agent or Firm:
RAU, SCHNECK & HÜBNER PATENTANWÄLTE RECHTSANWÄLTE PARTGMBB (Nürnberg, DE)
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