Title:
IMIDE SULFONATE COMPOUND, PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO/2015/146053
Kind Code:
A1
Abstract:
Provided are: a non-ionic photoacid generator including an imide sulfonate compound and having high light sensitivity to an i-line, excellent thermal stability, and excellent solubility in a hydrophobic material; and a resin composition for photolithography including the same. The present invention is an imide sulfonate compound represented by general formula (1). [In formula (1), R1 to R8 is each independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 18 carbon atoms, a fluoroalkyl group having 1 to 18 carbon atoms, etc. At least two of R1 to R8 may be joined to form a ring structure. R9 is a hydrocarbon group having 1 to 18 carbon atoms which may have a substituent (a part or all of the hydrogen may be substituted with fluorine).]
Inventors:
OKA MASAAKI (JP)
KIMURA HIDEKI (JP)
IKEDA TAKUYA (JP)
KIMURA HIDEKI (JP)
IKEDA TAKUYA (JP)
Application Number:
PCT/JP2015/001406
Publication Date:
October 01, 2015
Filing Date:
March 13, 2015
Export Citation:
Assignee:
SAN APRO LTD (JP)
International Classes:
C07D223/18; C09K3/00; G03F7/004; G03F7/038; H01L21/027
Domestic Patent References:
| WO2011087011A1 | 2011-07-21 |
Foreign References:
| JPH02100054A | 1990-04-12 | |||
| JPH112901A | 1999-01-06 | |||
| JP2004217748A | 2004-08-05 | |||
| JP2008266495A | 2008-11-06 | |||
| US20110229821A1 | 2011-09-22 | |||
| JP2013001821A | 2013-01-07 | |||
| JP2005314633A | 2005-11-10 |
Attorney, Agent or Firm:
HAYASHI, HIROSHI (JP)
Wood Hiroshi (JP)
Wood Hiroshi (JP)
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