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Title:
IMMERSION PHOTOLITHOGRAPHY SYSTEM
Document Type and Number:
WIPO Patent Application WO2006003373
Kind Code:
A3
Abstract:
In immersion photolithography, immersion fluid (30) is located between a wafer (28) and a lens (24) for projecting an image on to the wafer (28) through the immersion fluid (30). In order to inhibit evaporation from the immersion fluid, a purge fluid saturated with a component of the immersion fluid is conveyed about the immersion fluid.

Inventors:
GRANT ROBERT BRUCE (GB)
STOCKMAN PAUL ALAN (US)
Application Number:
PCT/GB2005/002473
Publication Date:
March 30, 2006
Filing Date:
June 22, 2005
Export Citation:
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Assignee:
BOC GROUP PLC (GB)
GRANT ROBERT BRUCE (GB)
STOCKMAN PAUL ALAN (US)
International Classes:
G03F7/20
Domestic Patent References:
WO2004093130A22004-10-28
WO2005101121A22005-10-27
Foreign References:
EP1420298A22004-05-19
US6496257B12002-12-17
FR2474708A11981-07-31
EP0023231A11981-02-04
Other References:
PATENT ABSTRACTS OF JAPAN vol. 012, no. 420 (E - 679) 8 November 1988 (1988-11-08)
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