Title:
IMPACT RESISTANCE MODIFIER AND RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2005/097856
Kind Code:
A1
Abstract:
Disclosed is a resin composition having excellent impact resistance without deteriorating excellent transparency of a methacrylic resin. Specifically, an impact resistance modifier composed of a multilayered polymer having at least two layers, namely 100 parts by mass of an inner-layer polymer which contains an alkyl acrylate and a multifunctional monomer and has a mass-average particle size of 200-300 nm and 30-100 parts by mass of an outer-layer polymer which contains an alkyl methacrylate and has a Tg of 20-80&ring C, is blended into a methacrylic resin whose main constitutional unit is a methyl methacrylate.
Inventors:
NAGASAKA TOSHIO (JP)
YANAI TOSHIMI (JP)
HATAKEYAMA HIROKI (JP)
YANAI TOSHIMI (JP)
HATAKEYAMA HIROKI (JP)
Application Number:
PCT/JP2005/005499
Publication Date:
October 20, 2005
Filing Date:
March 25, 2005
Export Citation:
Assignee:
MITSUBISHI RAYON CO (JP)
NAGASAKA TOSHIO (JP)
YANAI TOSHIMI (JP)
HATAKEYAMA HIROKI (JP)
NAGASAKA TOSHIO (JP)
YANAI TOSHIMI (JP)
HATAKEYAMA HIROKI (JP)
International Classes:
C08F265/06; C08L33/12; C08L51/00; (IPC1-7): C08F265/06; C08L33/12; C08L51/00
Foreign References:
JPS5829810A | 1983-02-22 | |||
JPH02225510A | 1990-09-07 | |||
JP2003105023A | 2003-04-09 | |||
JP2001031828A | 2001-02-06 | |||
JPH11322860A | 1999-11-26 | |||
JPH08245854A | 1996-09-24 | |||
JPH0423815A | 1992-01-28 | |||
JPH0517654A | 1993-01-26 |
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