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Patent Searching and Data


Title:
IMPACT RESISTANCE MODIFIER AND RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2005/097856
Kind Code:
A1
Abstract:
Disclosed is a resin composition having excellent impact resistance without deteriorating excellent transparency of a methacrylic resin. Specifically, an impact resistance modifier composed of a multilayered polymer having at least two layers, namely 100 parts by mass of an inner-layer polymer which contains an alkyl acrylate and a multifunctional monomer and has a mass-average particle size of 200-300 nm and 30-100 parts by mass of an outer-layer polymer which contains an alkyl methacrylate and has a Tg of 20-80&ring C, is blended into a methacrylic resin whose main constitutional unit is a methyl methacrylate.

Inventors:
Nagasaka, Toshio c/o Corporate Research Laboratories (Mitsubishi Rayon Co. Ltd., 20-1, Miyuki-ch, Otake-shi Hiroshima, 739-0693, JP)
Yanai, Toshimi c/o Otake, Plants (Mitsubishi Rayon Co. Ltd., 20-1, Miyuki-ch, Otake-shi Hiroshima, 739-0693, JP)
Hatakeyama, Hiroki c/o Otake, Plants (Mitsubishi Rayon Co. Ltd., 20-1, Miyuki-ch, Otake-shi Hiroshima, 739-0693, JP)
Application Number:
PCT/JP2005/005499
Publication Date:
October 20, 2005
Filing Date:
March 25, 2005
Export Citation:
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Assignee:
MITSUBISHI RAYON CO., LTD. (6-41, Konan 1-chome Minato-ku, Tokyo, 108-8506, JP)
Nagasaka, Toshio c/o Corporate Research Laboratories (Mitsubishi Rayon Co. Ltd., 20-1, Miyuki-ch, Otake-shi Hiroshima, 739-0693, JP)
Yanai, Toshimi c/o Otake, Plants (Mitsubishi Rayon Co. Ltd., 20-1, Miyuki-ch, Otake-shi Hiroshima, 739-0693, JP)
Hatakeyama, Hiroki c/o Otake, Plants (Mitsubishi Rayon Co. Ltd., 20-1, Miyuki-ch, Otake-shi Hiroshima, 739-0693, JP)
International Classes:
C08F265/06; C08L33/12; C08L51/00; (IPC1-7): C08F265/06; C08L33/12; C08L51/00
Foreign References:
JPS5829810A
JPH02225510A
JP2003105023A
JP2001031828A
JPH11322860A
JPH08245854A
JPH0423815A
JPH0517654A
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