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Patent Searching and Data


Title:
IMPACT RESISTANCE MODIFIER AND RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2005/097856
Kind Code:
A1
Abstract:
Disclosed is a resin composition having excellent impact resistance without deteriorating excellent transparency of a methacrylic resin. Specifically, an impact resistance modifier composed of a multilayered polymer having at least two layers, namely 100 parts by mass of an inner-layer polymer which contains an alkyl acrylate and a multifunctional monomer and has a mass-average particle size of 200-300 nm and 30-100 parts by mass of an outer-layer polymer which contains an alkyl methacrylate and has a Tg of 20-80&ring C, is blended into a methacrylic resin whose main constitutional unit is a methyl methacrylate.

Inventors:
NAGASAKA TOSHIO (JP)
YANAI TOSHIMI (JP)
HATAKEYAMA HIROKI (JP)
Application Number:
PCT/JP2005/005499
Publication Date:
October 20, 2005
Filing Date:
March 25, 2005
Export Citation:
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Assignee:
MITSUBISHI RAYON CO (JP)
NAGASAKA TOSHIO (JP)
YANAI TOSHIMI (JP)
HATAKEYAMA HIROKI (JP)
International Classes:
C08F265/06; C08L33/12; C08L51/00; (IPC1-7): C08F265/06; C08L33/12; C08L51/00
Foreign References:
JPS5829810A1983-02-22
JPH02225510A1990-09-07
JP2003105023A2003-04-09
JP2001031828A2001-02-06
JPH11322860A1999-11-26
JPH08245854A1996-09-24
JPH0423815A1992-01-28
JPH0517654A1993-01-26
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