Title:
IMPEDANCE MATCHING METHOD, IMPEDANCE MATCHING APPARATUS AND PLASMA GENERATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/228133
Kind Code:
A1
Abstract:
Disclosed are an impedance matching method, an impedance matching apparatus and a plasma generation device. The impedance matching method is used for matching the impedance between a radio-frequency source and a load connected to the radio-frequency source, and comprises: selectively performing an automatic matching step or a frequency sweep matching step according to the working mode of the radio-frequency source, wherein in the automatic matching step, indicating a motor to drive an impedance matching network to provide a certain impedance; and in the frequency sweep matching step, indicating the motor to stop driving and the radio-frequency source to perform a frequency sweep operation. According to embodiments of the present invention, the phenomenon of unstable and non-repetitive matching caused by fast impedance change in the impedance matching process can be effectively avoided, and a larger process window and the process stability can be implemented.
Inventors:
YANG JING (CN)
WEI GANG (CN)
WEI JING (CN)
WEI GANG (CN)
WEI JING (CN)
Application Number:
PCT/CN2018/087612
Publication Date:
December 20, 2018
Filing Date:
May 21, 2018
Export Citation:
Assignee:
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD (CN)
International Classes:
H01J37/32
Foreign References:
| CN1520245A | 2004-08-11 | |||
| CN103730316A | 2014-04-16 | |||
| US20160126069A1 | 2016-05-05 |
Attorney, Agent or Firm:
TEE&HOWE INTELLECTUAL PROPERTY ATTORNEYS (CN)
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