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Title:
IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING ARTICLE
Document Type and Number:
WIPO Patent Application WO/2016/208160
Kind Code:
A1
Abstract:
An imprint apparatus brings a pattern region of a mold held by a mold holder into contact with an imprint material supplied onto a substrate held by a substrate holder and cures the imprint material. The apparatus includes a rotation mechanism configured to rotate the substrate, and a conveying mechanism configured to convey the substrate from the rotation mechanism to the substrate holder. The conveying mechanism conveys the substrate to the substrate holder after the rotation mechanism rotates the substrate in accordance with a rotation error in the pattern region in a state that the mold holder holds the mold (S510-S540).

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Inventors:
FURUKAWA HIROAKI (JP)
Application Number:
PCT/JP2016/002908
Publication Date:
December 29, 2016
Filing Date:
June 16, 2016
Export Citation:
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Assignee:
CANON KK (JP)
International Classes:
H01L21/027; B29C59/02
Foreign References:
US20120091611A12012-04-19
US20110147970A12011-06-23
US20100314798A12010-12-16
US6188467B12001-02-13
JPH10177942A1998-06-30
Attorney, Agent or Firm:
OHTSUKA, Yasunori et al. (KIOICHO PARK BLDG. 3-6, KIOICHO, CHIYODA-K, Tokyo 94, JP)
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