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Patent Searching and Data


Title:
IMPRINT METHOD, IMPRINT DEVICE, MOLD MANUFACTURING METHOD, AND ARTICLE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/163565
Kind Code:
A1
Abstract:
This imprint method comprises performing an imprint process for curing an imprint material over a shot region of a substrate in a state in which the imprint material and a pattern portion of a mold are in contact with each other. The imprint method comprises an adjusting step in which, in accordance with shape information indicating the shape of a surface of at least one of the shot region and the pattern portion in a thickness direction of the pattern portion in the above state, at least one of distortion of the shot region in a planar direction orthogonal to the thickness direction and distortion of the pattern portion in the planar direction is adjusted.

Inventors:
SEKI, Junichi (30-2 Shimomaruko 3-chome, Ohta-k, Tokyo 01, 〒1468501, JP)
Application Number:
JP2019/004625
Publication Date:
August 29, 2019
Filing Date:
February 08, 2019
Export Citation:
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Assignee:
CANON KABUSHIKI KAISHA (30-2, Shimomaruko 3-chome Ohta-k, Tokyo 01, 〒1468501, JP)
International Classes:
H01L21/027; B29C59/02
Attorney, Agent or Firm:
OHTSUKA, Yasunori et al. (7th Fl, Kioicho Park Bldg. 3-6, Kioicho, Chiyoda-k, Tokyo 94, 〒1020094, JP)
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