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Patent Searching and Data


Title:
IMPRINT SYSTEM AND ARTICLE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/105418
Kind Code:
A1
Abstract:
Provided is a replica manufacturing device which performs an imprint process for forming an imprint material pattern on a replica substrate using a master mold, fabricates a replica mold by processing the replica substrate with the pattern formed thereon, and transfers data relating to a condition concerning the imprint process to a management device. An imprint device acquires data from the management device, and performs an imprint process for forming an imprint material pattern on a substrate using the replica mold in accordance with the condition included in the acquired data.

Inventors:
YAMAMOTO KIYOHITO (JP)
Application Number:
PCT/JP2017/042311
Publication Date:
June 14, 2018
Filing Date:
November 27, 2017
Export Citation:
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Assignee:
CANON KK (JP)
International Classes:
H01L21/027; B29C59/02
Foreign References:
JP2016178127A2016-10-06
JP2016092270A2016-05-23
JP2012234901A2012-11-29
Attorney, Agent or Firm:
OHTSUKA, Yasunori et al. (JP)
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