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Patent Searching and Data


Title:
IMPRINT TEMPLATE AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2016/051928
Kind Code:
A1
Abstract:
[Problem] To provide a low-cost imprint template with which the trapping of air can be reduced in photocurable imprinting, and which has excellent transferability to a substrate having curvature, and to provide a method for manufacturing this imprint template. [Solution] A template used in UV nano-imprinting, said template characterized by having a flexible, light-transmitting fixed plate (1c), a transparent resin buffer layer (1b) formed on top of the fixed plate, and a resin film mold (1a) adhered in a removable manner to the top of the transparent resin buffer layer (1b), with one or a combination of a plurality of the resin film molds (1a) forming an irregular transfer pattern on the surface thereof.

Inventors:
OBATA TSUTOMU (JP)
YOKOYAMA YOSHIYUKI (JP)
NASUNO MASAAKI (JP)
KUCHIKI MIKIHARU (JP)
AONO TOMOSHI (JP)
KASHIWAGI MOTOFUMI (JP)
Application Number:
PCT/JP2015/070392
Publication Date:
April 07, 2016
Filing Date:
July 16, 2015
Export Citation:
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Assignee:
TOYAMA PREFECTURE (JP)
KYORITSU CHEMICAL & CO LTD (JP)
ZEON CORP (JP)
International Classes:
H01L21/027; B29C33/38; B29C59/02
Domestic Patent References:
WO2010001538A12010-01-07
Foreign References:
JP2012253236A2012-12-20
JP2012169313A2012-09-06
JP2008179034A2008-08-07
JP2004039136A2004-02-05
JP2013067084A2013-04-18
JP2010030057A2010-02-12
Other References:
MARC VERSCHUUREN ET AL.: "3D Photonic Structures by Sol-Gel Imprint Lithography", MATERIALS RESEARCH SOCIETY SYMPOSIA PROCEEDINGS, vol. 1002, 17 March 2011 (2011-03-17)
TSUTOMU OBATA ET AL.: "Development of next-generation substrate technology for LED", REPORTS OF THE TOYAMA INDUSTRIAL TECHNOLOGY CENTER, 23 July 2014 (2014-07-23), pages 46 - 47
Attorney, Agent or Firm:
OTANI Kaichi (JP)
Kaichi Otani (JP)
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