Title:
IN-PLANE MAGNETIZED FILM, IN-PLANE MAGNETIZED FILM MULTILAYER STRUCTURE, HARD BIAS LAYER, MAGNETORESISTIVE ELEMENT, AND SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2020/090914
Kind Code:
A1
Abstract:
Provided is a CoPt-oxide-based in-plane magnetized film which has a magnetic coercive force Hc of 2.00 kOe or more and has remanent magnetization Mrt per unit area of 2.00 memu/cm2 or more. An in-plane magnetized film (10) for use as a hard bias layer (14) in a magnetoresistive element (12), which contains metal Co, metal Pt and an oxide, wherein the metal Co and the metal Pt are contained in amounts of 55 at% or more and less than 95 at% and more than 5 at% and 45 at% or less, respectively, relative to the total amount of the metal components in the in-plane magnetized film (10), the oxide is contained in an amount of 10 to 42 vol% inclusive relative to the whole amount of the in-plane magnetized film (10), and the thickness is 20 to 80 nm inclusive.
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Inventors:
THAM KIM KONG (JP)
KUSHIBIKI RYOUSUKE (JP)
AONO MASAHIRO (JP)
WATANABE YASUNOBU (JP)
KUSHIBIKI RYOUSUKE (JP)
AONO MASAHIRO (JP)
WATANABE YASUNOBU (JP)
Application Number:
PCT/JP2019/042628
Publication Date:
May 07, 2020
Filing Date:
October 30, 2019
Export Citation:
Assignee:
TANAKA PRECIOUS METAL IND (JP)
International Classes:
H01F10/16; H01F41/18; H01L43/08
Foreign References:
| JPH11238925A | 1999-08-31 | |||
| JP2006107625A | 2006-04-20 |
Attorney, Agent or Firm:
MATSUYAMA, Keisuke et al. (JP)
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