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Patent Searching and Data


Title:
INCLINATION MEASUREMENT SYSTEM FOR PHOTOGRAPHING MODULE AND MEASUREMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2017/162201
Kind Code:
A1
Abstract:
Provided are an inclination measurement system for a photographing module and a measurement method thereof. The system comprises a target, a light source and an object distance simulation optical structure. The light source is used to illuminate the target. The target is photographed by a measured photographing module. The object distance simulation optical structure simulates an object distance of the target. By simulating a change in the object distance between the target and the measured photographing module within a predetermined range, inclination calculation for the measured photographing module can be realized.

Inventors:
DING LIANG (CN)
WANG MINGZHU (CN)
LIAO HAILONG (CN)
ZHONG LING (CN)
Application Number:
PCT/CN2017/078037
Publication Date:
September 28, 2017
Filing Date:
March 24, 2017
Export Citation:
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Assignee:
NINGBO SUNNY OPOTECH CO LTD (CN)
International Classes:
H04N17/00
Foreign References:
CN105744266A2016-07-06
CN103149789A2013-06-12
CN101957553A2011-01-26
CN102662293A2012-09-12
CN105025290A2015-11-04
CN102889879A2013-01-23
US20080145041A12008-06-19
Attorney, Agent or Firm:
NINGBO RAYMOND IP AGENCY FIRM (CN)
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