Title:
INDIRECTLY HEATED CATHODE ION SOURCE
Document Type and Number:
WIPO Patent Application WO2003100806
Kind Code:
A9
Abstract:
An indirectly heated cathode ion source includes an arc chamber housing that defines an arc chamber, an indirectly heated cathode and a filament for heating the cathode. The cathode may include an emitting portion having a front surface, a rear surface and a periphery, a support rod attached to the rear surface of the emitting portion, and a skirt extending from the periphery of the emitting portion. A cathode assembly may include the cathode, a filament and a clamp assembly for mounting the cathode and the filament in a fixed spatial relationship and for conducting electrical energy to the cathode and the filament. The filament is positioned in a cavity defined by the emitting portion and the skirt of the cathode. The ion source may include a shield for inhibiting escape of electrons and plasma from a region outside the arc hamber in proximity to the filament and the cathode.
Inventors:
MACIEJOWSKI PETER E
OLSON JOSEPH C
CHANG SHENGWU
PEDERSEN BJORN O
KLOS LEO V JR
DISTASO DANIEL
BERGERON CURT D
OLSON JOSEPH C
CHANG SHENGWU
PEDERSEN BJORN O
KLOS LEO V JR
DISTASO DANIEL
BERGERON CURT D
Application Number:
PCT/US2003/016153
Publication Date:
March 04, 2004
Filing Date:
May 22, 2003
Export Citation:
Assignee:
VARIAN SEMICONDUCTOR EQUIPMENT (US)
International Classes:
H01J27/02; H01J27/04; H01J27/08; H01J37/08; H01J37/317; (IPC1-7): H01J1/26; H01J27/08; H01J1/20; H01J27/02
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