Title:
INDUCTIVE COUPLED COIL AND INDUCTIVE COUPLED PLASMA DEVICE USING THE SAME
Document Type and Number:
WIPO Patent Application WO/2008/028372
Kind Code:
A1
Abstract:
An inductive coupled coil or an inductive coupled plasma device using the same comprises
an internal coil and an exterior coil. The internal coil and the exterior coil
are independent and are in coaxial alignment. The internal coil is consist of
several independent internal sub-coils nested each other that is the same in
structure, and the several independent internal sub-coils are arranged symmetrically respect
to an axes. The exterior coil is consist of several independent exterior sub-coils
nested each other that is the same in structure, and the several independent exterior
sub-coils are arranged symmetrically respect to an axes. The inductive coupled
coil is located on the reaction chamber of the inductive coupled plasma device
and is connected to a RF power. It can make the plasma distribute uniformly on the
chip in the reaction chamber so that the difference in chemical reaction rate
on the surface of the chip is small and the quality of the etched chip is improved. They
can be applied in a semiconductor chip process device and other devices.
Inventors:
SONG QIAOLI (CN)
NAN JIANHUI (CN)
NAN JIANHUI (CN)
Application Number:
PCT/CN2007/000309
Publication Date:
March 13, 2008
Filing Date:
January 26, 2007
Export Citation:
Assignee:
BEIJING NMC CO LTD (CN)
SONG QIAOLI (CN)
NAN JIANHUI (CN)
SONG QIAOLI (CN)
NAN JIANHUI (CN)
International Classes:
H01F5/00; H01F38/14
Foreign References:
| US6480086B1 | 2002-11-12 | |||
| US20020186114A1 | 2002-12-12 | |||
| CN1812010A | 2006-08-02 |
Attorney, Agent or Firm:
TEE & HOWE INTELLECTUAL PROPERTY ATTORNEY (YuanRoom 718, Beijing Capital Times Square, 88 Xichang'an Avenue, Xicheng District, Beijing 1, CN)
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