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Title:
INDUCTIVE COUPLING COIL AND INDUCTIVE COUPLING PLASMA APPARATUS THEREOF
Document Type and Number:
WIPO Patent Application WO/2008/031321
Kind Code:
A1
Abstract:
An inductive coupling coil comprises a plenty of separate portions with the same structure. A plenty of separate portions are coaxial and are distributed symmetrically about an axes. An inductive coupling plasma apparatus which applies an inductive coupling coil comprises a reactive chamber, an dielectric window set on the reactive chamber, in which the inductive coupling coil is set on the dielectric window and is connected to an RF source via an RF adapter.

Inventors:
SONG, Qiaoli (No.1 East Jiuxianqiao Road, Chaoyang District, Beijing 6, 100016, CN)
宋巧丽 (中国北京市朝阳区酒仙桥东路1号M5楼南二层, Beijing 6, 100016, CN)
Application Number:
CN2007/002451
Publication Date:
March 20, 2008
Filing Date:
August 14, 2007
Export Citation:
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Assignee:
BEIJING NMC CO., LTD. (No.1 East Jiuxianqiao Road, Chaoyang District, Beijing 6, 100016, CN)
北京北方微电子基地设备工艺研究中心有限责任公司 (中国北京市朝阳区酒仙桥东路1号M5楼南二层, Beijing 6, 100016, CN)
SONG, Qiaoli (No.1 East Jiuxianqiao Road, Chaoyang District, Beijing 6, 100016, CN)
International Classes:
H01F38/14; H01F5/00; H01F21/00; H01L21/306; H05H1/46
Foreign References:
US20020186114A1
CN2785105Y
US5309063A
CN2726076Y
Attorney, Agent or Firm:
TEE & HOWE INTELLECTUAL PROPERTY ATTORNEYS (Tianshu ZHANG, Room 718 Beijing Capital Times Square, 88 Xichang,88 Xichang' an Avenue,Xicheng District, Beijing 1, 100031, CN)
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