Title:
INDUCTIVE PLASMA SOURCE WITH METALLIC SHOWER HEAD USING B-FIELD CONCENTRATOR
Document Type and Number:
WIPO Patent Application WO/2011/142957
Kind Code:
A3
Abstract:
A method and apparatus for plasma processing of substrates is provided. A processing chamber has a substrate support and a lid assembly facing the substrate support. The lid assembly has a plasma source that comprises an inductive coil disposed within a conductive plate, which may comprise nested conductive rings. The inductive coil is substantially coplanar with the conductive plate, and insulated therefrom by an insulator that fits within a channel formed in the conductive plate, or nests within the conductive rings. A field concentrator is provided around the inductive coil, and insulated therefrom by isolators. The plasma source is supported from a conductive support plate. A gas distributor supplies gas to the chamber through a central opening of the support plate and plasma source from a conduit disposed through the conductive plate.
Inventors:
LAI CANFENG (US)
TOBIN JEFFREY (US)
PORSCHNEV PETER I (US)
MARIN JOSE ANTONIO (US)
TOBIN JEFFREY (US)
PORSCHNEV PETER I (US)
MARIN JOSE ANTONIO (US)
Application Number:
PCT/US2011/033735
Publication Date:
February 23, 2012
Filing Date:
April 25, 2011
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
LAI CANFENG (US)
TOBIN JEFFREY (US)
PORSCHNEV PETER I (US)
MARIN JOSE ANTONIO (US)
LAI CANFENG (US)
TOBIN JEFFREY (US)
PORSCHNEV PETER I (US)
MARIN JOSE ANTONIO (US)
International Classes:
H05H1/46; H01L21/205; H01L21/3065
Foreign References:
| JP2000331993A | 2000-11-30 | |||
| KR20090009369A | 2009-01-23 | |||
| JP2000511701A | 2000-09-05 | |||
| JP2001291704A | 2001-10-19 | |||
| KR20090078682A | 2009-07-20 |
Attorney, Agent or Firm:
PATTERSON, B. Todd et al. (L.L.P.3040 Post Oak Blvd., Suite 150, Houston Texas, US)
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