Title:
INDUCTIVELY COUPLED PLASMA DEVICE FOR TREATING EXHAUST GAS
Document Type and Number:
WIPO Patent Application WO/2023/211105
Kind Code:
A1
Abstract:
According to the present invention, provided is an inductively coupled plasma device for treating an exhaust gas, comprising: an inductively coupled plasma reactor which is provided in an exhaust pipe through which an exhaust gas generated in a process chamber of semiconductor fabricating equipment is discharged, and generates an inductively coupled plasma to treat the exhaust gas for each repeated operation cycle; a power source for supplying high frequency power to the inductively coupled plasma reactor through a transmission line; and an impedance matching unit for matching the impedance of the inductively coupled plasma reactor to the impedance of the power source, wherein the impedance matching unit includes a first impedance changing unit having a variable power storage element, a second impedance changing unit having a transformer, an operation data measurement device for measuring operation data of the inductively coupled plasma reactor, and a controller which uses an operation data sampling value acquired by means of the operation data measurement device in one operation cycle so as to adjust capacitance generated by the variable power storage element, and which controls whether the transformer operates so as to change matching impedance.
Inventors:
BAE JIN HO (KR)
RA JEONG KYUN (KR)
KIM MIN JAE (KR)
RA JEONG KYUN (KR)
KIM MIN JAE (KR)
Application Number:
PCT/KR2023/005586
Publication Date:
November 02, 2023
Filing Date:
April 25, 2023
Export Citation:
Assignee:
LOT CES CO LTD (KR)
International Classes:
H01J37/32; B01D53/32
Foreign References:
| KR101145294B1 | 2012-05-15 | |||
| KR101993880B1 | 2019-06-27 | |||
| KR20220038044A | 2022-03-25 | |||
| KR20150064722A | 2015-06-11 | |||
| KR20070009144A | 2007-01-18 |
Attorney, Agent or Firm:
JEON, Yong Joon (KR)
Download PDF: