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Title:
INFRARED-LIGHT SHIELDING COMPOSITION, INFRARED-LIGHT CUTOFF FILTER, AND SOLID-STATE IMAGING ELEMENT
Document Type and Number:
WIPO Patent Application WO/2016/035633
Kind Code:
A1
Abstract:
 Provided are: an infrared-light shielding composition having excellent drying resistance and excellent flat application properties, whereby an infrared-light cutoff filter can be formed in which the occurrence of a pattern on the surface thereof is suppressed; an infrared-light cutoff filter; and a solid-state imaging element. This infrared-light shielding composition includes at least metal-containing tungsten oxide particles, a resin binder, a solvent A having a boiling point of 170°C to 200°C at 1 atmosphere, and a solvent B different from the solvent A, the content of the solvent A being 0.1-20% by mass with respect to the total mass of the infrared-light shielding composition.

Inventors:
TOMEBA Hisamitsu (4000 Kawashiri, Yoshida-cho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
Application Number:
JP2015/073965
Publication Date:
March 10, 2016
Filing Date:
August 26, 2015
Export Citation:
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Assignee:
FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome Minato-k, Tokyo 20, 〒1068620, JP)
International Classes:
G02B5/22; C08F2/44; C08F2/50; C08F291/00; C08F292/00; C09D4/00; C09D5/32; C09D201/00; C09K3/00; G03F7/004; G03F7/031; G03F7/032; G03F7/038; H01L27/14
Foreign References:
JP2012506463A2012-03-15
JP2012122045A2012-06-28
JP2009114326A2009-05-28
JP2014508315A2014-04-03
Attorney, Agent or Firm:
WATANABE Mochitoshi et al. (Yusen Iwamoto-cho Bldg. 6F, 3-3 Iwamoto-cho 2-chome, Chiyoda-k, Tokyo 32, 〒1010032, JP)
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