INFRARED REFLECTING SUBSTRATE AND METHOD FOR PRODUCING SAME

WIPO Patent Application WO/2015/133370

A1

This infrared reflecting substrate (100) sequentially comprises, on a transparent base (10), a first metal oxide layer (21), a second metal oxide layer (22) and a metal layer (30) in this order. The second metal oxide layer (22) and the metal layer (30) are in direct contact with each other. The first metal oxide layer (21) has a refractive index of 2.2 or more. It is preferable that the second metal oxide layer (22) is formed of a metal oxide that contains tin oxide and zinc oxide, while having an oxygen content smaller than that of the stoichiometric composition. The second metal oxide layer is preferably formed by a direct current sputtering method. A target which contains zinc atoms and tin atoms and is obtained by sintering a metal powder and zinc oxide and/or tin oxide is preferably used for the formation of the second metal oxide layer. It is preferable that the oxygen concentration in a gas to be introduced into a sputtering film formation chamber is 8% by volume or less. The present invention enables the achievement of an infrared reflecting substrate having high visible light transmittance and excellent durability.

JPH0239107	MULTILAYERED INTERFERENCE FILM
JP5153371	Image projection device
JP2012145958	OPTICAL ELEMENT

WATANABE MASAHIKO (JP)
OHMORI YUTAKA (JP)

PCT/JP2015/055702

September 11, 2015

February 26, 2015

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NITTO DENKO CORP (JP)

G02B5/26; B32B9/00; C23C14/06; C23C14/34

WO2010055832A1

2010-05-20

JPH11157881A	1999-06-15
JP2013256104A	2013-12-26
JP2005502076A	2005-01-20
JPH01317136A	1989-12-21
JPH029731A	1990-01-12
JP2007314364A	2007-12-06

See also references of EP 3115812A4

SHINTAKU, Masato et al. (JP)
Masahito Shintaku (JP)

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