Title:
INK SET FOR STEREOLITHOGRAPHY, STEREOLITHOGRAPHIC ARTICLE, AND METHOD FOR PRODUCING STEREOLITHOGRAPHIC ARTICLE
Document Type and Number:
WIPO Patent Application WO/2018/143303
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing: an ink set for stereolithography which is for obtaining a stereolithographic article exhibiting excellent mechanical properties and excellent dimensional accuracy; a stereolithographic article formed using the ink set for stereolithography; and a method for producing the stereolithographic article using the ink set for stereolithography. An ink set for stereolithography according to the present invention is provided with a model material composition and a support material composition. The model material composition includes: monofunctional ethylenically unsaturated monomers (A) which have a Tg of 80˚C or higher, and which do not have urethane groups; polyfunctional ethylenically unsaturated monomers (B) which have a ring structure, have a Tg of 180˚C or higher, and do not have urethane groups; an oligomer (C); and a photopolymerization initiator (D). The support material composition includes: 20-50 parts by weight of water-soluble monofunctional ethylenically unsaturated monomers (a); 20-49 parts by weight of polyalkylene glycol (b) including AO groups and/or PO groups; 35 or fewer parts by weight of a water-soluble organic solvent (c); and a photopolymerization initiator (d).
Inventors:
KITO KATSUYUKI (JP)
IZUMO TAEKO (JP)
IZUMO TAEKO (JP)
Application Number:
PCT/JP2018/003296
Publication Date:
August 09, 2018
Filing Date:
January 31, 2018
Export Citation:
Assignee:
MAXELL HOLDINGS LTD (JP)
International Classes:
B29C64/40; B29C64/112; B33Y10/00; B33Y70/00; B33Y80/00; C08F2/44; C08F290/06
Domestic Patent References:
WO2016199611A1 | 2016-12-15 | |||
WO2016121587A1 | 2016-08-04 |
Foreign References:
JP2016020474A | 2016-02-04 | |||
JP2016132773A | 2016-07-25 |
Attorney, Agent or Firm:
SAMEJIMA, Mutsumi et al. (JP)
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