INORGANIC FILM FORMING PROCESS AND SYSTEM

Title:

INORGANIC FILM FORMING PROCESS AND SYSTEM

Document Type and Number:

WIPO Patent Application WO/2005/099915

Kind Code:

A1

Abstract:

An inorganic film forming technology realizing an inorganic film excellent in durability at a low cost without requiring conventional waxing or polymerization. The inorganic film forming system comprises a charged water producing tank (1), a magnetic field processing tank (2), and a coating forming tank (3). The charged water producing tank (1) comprises a raw water supply opening (11), a charged water (b) take-out opening (12), and, inside thereof, a section (13) loaded with innumerable ceramic particles (14) containing at least silicon and aluminum as eluting components. The magnetic field processing tank (2) is provided with a charged water feeding opening (21) and a magnetic field processing water (c) take-out opening (22), and arranged with an S pole (23a) and an N pole (23b) for forming an electromagnetic field, wherein a charged water (b) passing channel (24) is provided between them. The coating forming tank (3) is provided with a magnetic field processing water (c) feeding opening (31), a processing drain (d) take out opening (32), and a nozzle (34) for ejecting pressurized magnetic field processing water (c) toward the surface of a work (33) arranged in the tank.

Inventors:

MOTOJIMA MAKOTO (JP)

Application Number:

PCT/JP2004/016983

Publication Date:

October 27, 2005

Filing Date:

November 16, 2004

Export Citation:

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Assignee:

M SKC LTD (JP)
MOTOJIMA MAKOTO (JP)

International Classes:

B05D7/24; C02F1/48; C02F1/68; C03C17/25; C08J7/06; C23C8/10; C23C8/16; C23C26/00; C02F9/00; (IPC1-7): B05D7/24; C02F1/48; C02F1/68; C03C17/25; C08J7/06; C23C26/00

Foreign References:

JP2000325964A	2000-11-28
JP2000192086A	2000-07-11
JPH09323087A	1997-12-16
JP2002248564A	2002-09-03
JP2003136060A	2003-05-13
JP2003094066A	2003-04-02

Other References: