INORGANIC POWDER, METHOD FOR PRODUCING SAME, AND RESIN COMPOSITION

WIPO Patent Application WO/2023/189589

A1

Provided are: an inorganic powder which has a lower coefficient of thermal expansion than conventional cristobalite powders and can attain a high degree of thermal expansion; a method for producing the inorganic powder; and a resin composition containing the inorganic powder.　The inorganic powder comprises at least two crystalline-silica powders which differ in α-β phase transition initiation temperature and in each of which the proportion of an α-cristobalite phase is 30 mass% or higher with respect to the total amount (100 mass%) of the crystalline phase and the amorphous phase. The inorganic powder has an X-ray diffraction peak assigned to the (101) plane of the α-cristobalite phase, the X-ray diffraction peak having a full width at half maximum (FWHM) of 0.120-0.300°.

JP2014055083	METHOD FOR PRODUCING HOLLOW SILICA PARTICLE
JP5615432	Silicon dioxide powder with special surface properties, and a toner composition containing the powder.
JP3359535	[Title of the Invention] A method for manufacturing a semiconductor device

KOBAYASHI TAKUJI (JP)
FUKAZAWA MOTOHARU (JP)
OKABE TAKUTO (JP)

PCT/JP2023/010036

October 05, 2023

March 15, 2023

Click for automatic bibliography generation  

DENKA COMPANY LTD (JP)

C01B33/18; C08K3/36; C08L101/00

WO2016031823A1	2016-03-03
WO2020241902A1	2020-12-03

SONODA & KOBAYASHI INTELLECTUAL PROPERTY LAW (JP)

View/Download PDF      PDF Help

Previous Patent: BEARING DEVICE AND GENERATOR

Next Patent: CRYSTALLINE SILICA POWDER AND RESIN COMPOSITION