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Title:
INSPECTING APPARATUS AND INSPECTING METHOD
Document Type and Number:
WIPO Patent Application WO/2011/083532
Kind Code:
A1
Abstract:
Detectors for optical axis adjustment and detectors for inspections have been separately provided in conventional methods for aligning the radius direction of wafers and the long side of elliptic beams with each other. Therefore, there has been a problem of having the long side of the optical beams not matching the radius direction on the detectors for inspection. Disclosed is a method wherein a multi-anode detector is used for the purpose of detecting scattered light from a wafer, data obtained from the detector (multi-anode) for detecting defects is used, the shape of a beam radiated to the wafer, a rotational shift between the radius direction and the beam long side, and the like are calculated, and the optical axis of the irradiation beam is adjusted. Furthermore, the method is provided with a means which feeds back the correction quantities for rotation and amplitude to inspection signal data, on the basis of the correction data, and corrects inspection data. Since fine correction by means of the adjustment of an optical system and signal processing is made possible, positional accuracy of defect inspection and accuracy of defect level (defect size) are improved.

Inventors:
ANDO KIMIAKI (JP)
KIKUCHI HIROSHI (JP)
INOUE YUJI (JP)
Application Number:
PCT/JP2010/007127
Publication Date:
July 14, 2011
Filing Date:
December 08, 2010
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP (JP)
ANDO KIMIAKI (JP)
KIKUCHI HIROSHI (JP)
INOUE YUJI (JP)
International Classes:
G01N21/956; H01L21/66
Foreign References:
JP2009236791A2009-10-15
JP2009180691A2009-08-13
JP2005003447A2005-01-06
JP2009150725A2009-07-09
JP2008096395A2008-04-24
JP2008076283A2008-04-03
JP2007240512A2007-09-20
JP2004101438A2004-04-02
JPS63315937A1988-12-23
JP2010123700A2010-06-03
JP2010085135A2010-04-15
Attorney, Agent or Firm:
INOUE, Manabu et al. (JP)
Manabu Inoue (JP)
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Claims:



 
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