Title:
INSPECTION DEVICE, UNIT SELECTION DEVICE, INSPECTION METHOD, AND INSPECTION PROGRAM
Document Type and Number:
WIPO Patent Application WO/2021/261168
Kind Code:
A1
Abstract:
An inspection device according to one aspect of the present invention extracts, from a target image, an attention area by using a first estimation model, executes, by using the extracted result of the attention area, calculation processing of a second estimation model, and determines whether there is a defect in a target product on the basis of the calculation result of the second estimation model. The first estimation model is generated on the basis of a plurality of first learning images obtained by imaging a non-defect product in a target environment, and the second estimation model is generated on the basis of a plurality of second learning images obtained by imaging defects. The calculation processing of the second estimation model includes generating a plurality of feature maps, which have different dimensions, by performing projection to low dimensional spaces. The extraction result of the attention area is integrated to at least any one of the plurality of feature maps in a process for the calculation processing of the second estimation model.
Inventors:
KURITA MASASHI (JP)
YAMAMOTO SAKON (JP)
HASEGAWA YUKI (JP)
HANZAWA YUKI (JP)
NAGAE SHIGENORI (JP)
KATO YUTAKA (JP)
YAMAMOTO SAKON (JP)
HASEGAWA YUKI (JP)
HANZAWA YUKI (JP)
NAGAE SHIGENORI (JP)
KATO YUTAKA (JP)
Application Number:
PCT/JP2021/020336
Publication Date:
December 30, 2021
Filing Date:
May 28, 2021
Export Citation:
Assignee:
OMRON TATEISI ELECTRONICS CO (JP)
International Classes:
G06T7/00; G01N21/88
Foreign References:
| JP2020085705A | 2020-06-04 | |||
| JP2016148747A | 2016-08-18 |
Attorney, Agent or Firm:
TACHIBANA, Kenji et al. (JP)
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