Title:
INSPECTION DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/153051
Kind Code:
A1
Abstract:
An inspection device (1) includes the following which are provided inside an inspection chamber: holders (65) for holding the sides of a photomask (10); a camera (64) for capturing an image, from below, of the inspection surface of the photomask which has been placed on the holders; and an X-stage (61), a Y-stage (62), and a θ-stage (63) for specifying the image capture position of the photomask. The ceiling of the inspection chamber is provided with an FFU that generates a downflow. The X-stage, the Y-stage, and the θ-stage are covered by a cover (60) that has openings in the top surface thereof, and the opening edges (60a) of the cover are positioned at least partly on the inner sides of the outer edges (65a) of the holders.
Inventors:
HADA EMIKO (JP)
NARITA SYOUHEI (JP)
AMBAI YASUHITO (JP)
NARITA SYOUHEI (JP)
AMBAI YASUHITO (JP)
Application Number:
PCT/JP2016/059721
Publication Date:
September 29, 2016
Filing Date:
March 25, 2016
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD (JP)
International Classes:
G03F1/84; G01N21/956
Foreign References:
| JP2008241360A | 2008-10-09 | |||
| JP2012208185A | 2012-10-25 | |||
| JP2013210238A | 2013-10-10 | |||
| JP2010066240A | 2010-03-25 | |||
| JP2006292961A | 2006-10-26 | |||
| JP2006184283A | 2006-07-13 | |||
| JP2010262214A | 2010-11-18 |
Attorney, Agent or Firm:
NAGAI Hiroshi et al. (JP)
Hiroyuki Nagai (JP)
Hiroyuki Nagai (JP)
Download PDF:
Previous Patent: ANTI-FOGGING COMPOSITION AND ANTI-FOGGING FILM
Next Patent: PHOTOMASK MANUFACTURING METHOD AND INSPECTION APPARATUS
Next Patent: PHOTOMASK MANUFACTURING METHOD AND INSPECTION APPARATUS