Title:
INSPECTION METHOD AND INSPECTION DEVICE
Document Type and Number:
WIPO Patent Application WO/2014/089801
Kind Code:
A1
Abstract:
Disclosed are an inspection method and an inspection device for an array substrate. The inspection method includes the steps of: scanning a defect of an array substrate, and determining the dimension of the defect; according to the dimension of the defect, generating a switching control instruction, and switching a lens to a magnification suitable for the defect dimension; and photographing the defect using the switched lens. By analyzing the dimension of a scanned defect, and switching a photographing lens according to the defect dimension, the present invention enables the switched lens to photograph a clear and complete picture of the defect, which facilitates the analysis of the defect type, and effectively improves the analysis accuracy rate of the defect.
Inventors:
LIN YUNGYU (CN)
Application Number:
PCT/CN2012/086535
Publication Date:
June 19, 2014
Filing Date:
December 13, 2012
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
LIN YUNGYU (CN)
LIN YUNGYU (CN)
International Classes:
G01N21/88
Foreign References:
| CN102798634A | 2012-11-28 | |||
| CN1473360A | 2004-02-04 | |||
| KR20120006860A | 2012-01-19 | |||
| KR20110070062A | 2011-06-24 |
Attorney, Agent or Firm:
CENFO INTELLECTUAL PROPERTY AGENCY (CN)
深圳市世纪恒程知识产权代理事务所 (CN)
深圳市世纪恒程知识产权代理事务所 (CN)
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