INSPECTION METHOD AND MANUFACTURING METHOD FOR STRUCTURE AND INSPECTION APPARATUS AND MANUFACTURING APPARATUS FOR STRUCTURE

WIPO Patent Application WO/2020/153063

A1

It is possible to detect, with high accuracy, whether a structure is a good product or a defective product. This inspection apparatus for a structure comprises: X-ray emitting means (1a, 1b) for emitting X-rays through two or more paths; one or more X-ray detection means (3) for detecting the X-rays passing through the a structure (2); a multiple position distance measurement means (4) for measuring the distance from the X-ray emitting means to the structure at a plurality of positions; and an image processing means (5). The image processing means includes: a defective candidate detection means for detecting a defective candidate in two or more images acquired by the X-ray detection means; a height measurement means; an image calculation means for logically multiplying an image, on which height position information obtained by the height measurement means is recorded, by a defective candidate image obtained by the defective candidate detection means; an inspection range setting means for setting an inspection range from the distance and the thickness of the structure; and a defect determination means for determining that there is a defect when the inspection range includes the defective candidate.

SUGIHARA HIROKI (JP)
TANINO TAKAHIRO (JP)

PCT/JP2019/049802

July 30, 2020

December 19, 2019

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TORAY INDUSTRIES (JP)

G01B11/00; G01B11/24; G01B15/00; G01N23/044; G01N23/18

JP2010281648A	2010-12-16
JP2014190701A	2014-10-06
JP2003240736A	2003-08-27
JP2014157136A	2014-08-28
US7974379B1	2011-07-05
US20110299653A1	2011-12-08
JP2014501818A	2014-01-23
JPH049606A	1992-01-14

See also references of EP 3916342A4

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