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Title:
INTEGRATED FULL WAVELENGTH SPECTROMETER FOR WAFER PROCESSING
Document Type and Number:
WIPO Patent Application WO2001075934
Kind Code:
A3
Abstract:
A process chamber with a computer system that controls the process chamber is connected to one or more spectrometers. The spectrometers may be part of an interferometer or may be an optical emission spectrometer. The spectrometers may be CCD or photodiode arrays of 2,048 elements. An input board forms part of the computer system and is directly connected to the spectrometers. The input board provides data from the spectrometers to dual port memory, which is directly accessible to the CPU of the computer system. The use of a state machine and adder on the input board allows computation and placement of the data from the spectrometers on to the dual port memory, so that the CPU is not needed for such placement.

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Inventors:
TUQIANG NI (US)
NGO TUAN (US)
HUANG CHUNG-HO (US)
LIU ANDREW (US)
KAVEH FARRO (US)
Application Number:
PCT/US2001/008667
Publication Date:
May 02, 2002
Filing Date:
March 16, 2001
Export Citation:
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Assignee:
LAM RES CORP (US)
TUQIANG NI (US)
NGO TUAN (US)
HUANG CHUNG HO (US)
LIU ANDREW (US)
KAVEH FARRO (US)
International Classes:
G01N23/20; H01J37/32; (IPC1-7): G01N23/20; H01J37/32
Foreign References:
EP0677737A21995-10-18
US6090302A2000-07-18
US6157867A2000-12-05
US5347460A1994-09-13
US4267572A1981-05-12
US4365303A1982-12-21
US6077386A2000-06-20
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