Title:
INTRODUCTION OF AN INTERMEDIARY REFRACTIVE LAYER FOR IMMERSION LITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO2007002833
Kind Code:
A9
Abstract:
An intermediary layer is introduced between a lens and a wafer for an immersion lithography process. A non-supercritical gas is provided and condensed to form a layer of liquid between the lens and the wafer. The substrate may be irradiated through the lens and intermediary layer. In addition, the intermediary layer may then be evaporated. Steam may be the itermediary layer condensed to form a layer of water between the lens and wafer. The wafer may be irradiated with one of a EUV light and UV light. A system for introduction of an intermediary layer between a lens and a wafer for an immersion lithography process is provided. The wafer may include a hydrophobic and hydrophilic surfaces to provide enhanced contact angles between the wafer and the intermediary liquid layer condensed on the wafer and to reduce light aberration provided from a light source through the intermediary liquid layer.
Inventors:
CORBETT BLAISE (US)
Application Number:
PCT/US2006/025384
Publication Date:
March 08, 2007
Filing Date:
June 29, 2006
Export Citation:
Assignee:
CORBETT BLAISE (US)
International Classes:
G03B27/52
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