Title:
INVERSION MECHANISM IN SUBSTRATE CONVEYANCE MECHANISM AND IN POLARIZING FILM LAMINATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2011/122005
Kind Code:
A1
Abstract:
A substrate conveyance mechanism and polarizing film lamination device are provided with a first substrate conveyance mechanism (61) for conveying a rectangular substrate (5) in a state in which either the long or the short side thereof is aligned with the conveyance direction, and a second substrate conveyance mechanism (62) for conveying the aforementioned substrate (5) in a state in which the short or the long side is aligned with the conveyance direction; the disclosed inversion mechanism in the substrate conveyance mechanism or polarizing film lamination device is provided with an inversion mechanism (65) configured such that the aforementioned substrate (5) conveyed by the aforementioned first substrate conveyance mechanism (61) is inverted by means of the inversion action of the substrate inversion unit (67) and re-positioned on the aforementioned second substrate conveyance mechanism (62).
Inventors:
MATSUMOTO, Rikiya (1-6-42, Uwabara Niihama-sh, Ehime 46, 〒7920046, JP)
Application Number:
JP2011/001869
Publication Date:
October 06, 2011
Filing Date:
March 29, 2011
Export Citation:
Assignee:
SUMITOMO CHEMICAL COMPANY, LIMITED (27-1, Shinkawa 2-chome Chuo-k, Tokyo 60, 〒1048260, JP)
住友化学株式会社 (〒60 東京都中央区新川二丁目２７番１号 Tokyo, 〒1048260, JP)
住友化学株式会社 (〒60 東京都中央区新川二丁目２７番１号 Tokyo, 〒1048260, JP)
International Classes:
G02F1/13; B65G49/06; G02B5/30; G02F1/1335
Attorney, Agent or Firm:
TAKAHASHI, Katsuhiko (SAF Tokushige, 1st Floor Takahashi Kokusai Tokkyo Jimusho, 802-3, Tokushige 1-chome, Midori-ku, Nagoya-sh, Aichi 15, 〒4580815, JP)
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Claims: