ION BEAM DEVICE

WIPO Patent Application WO/2010/082466

A1

Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization ion source is comprised of an emitter tip (21) for generating ions; an emitter base mount (64) for supporting the emitter tip; an ionizing chamber which has an extraction electrode (24) opposed to the emitter tip and which is configured so as to surround the emitter tip (21); and a gas supply tube (25) for supplying gas to the vicinity of the emitter tip.  The emitter base mount and a vacuum container magnetically interact with each other.

SHICHI, Hiroyasu (HITACHI LTD., 280, Higashikoigakubo 1-chome, Kokubunji-sh, Tokyo 01, 〒1858601, JP)
志知広康 (〒01 東京都国分寺市東恋ヶ窪一丁目２８０番地株式会社日立製作所中央研究所内 Tokyo, 〒1858601, JP)
MATSUBARA, Shinichi (HITACHI LTD., 280, Higashikoigakubo 1-chome, Kokubunji-sh, Tokyo 01, 〒1858601, JP)
松原信一 (〒01 東京都国分寺市東恋ヶ窪一丁目２８０番地株式会社日立製作所中央研究所内 Tokyo, 〒1858601, JP)
SAHO, Norihide (HITACHI LTD., 832-2, Horiguchi, Hitachinaka-sh, Ibaraki 34, 〒3120034, JP)

JP2010/000086

July 22, 2010

January 08, 2010

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HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi Shinbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
株式会社日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目２４番１４号 Tokyo, 〒1058717, JP)
SHICHI, Hiroyasu (HITACHI LTD., 280, Higashikoigakubo 1-chome, Kokubunji-sh, Tokyo 01, 〒1858601, JP)
志知広康 (〒01 東京都国分寺市東恋ヶ窪一丁目２８０番地株式会社日立製作所中央研究所内 Tokyo, 〒1858601, JP)
MATSUBARA, Shinichi (HITACHI LTD., 280, Higashikoigakubo 1-chome, Kokubunji-sh, Tokyo 01, 〒1858601, JP)
松原信一 (〒01 東京都国分寺市東恋ヶ窪一丁目２８０番地株式会社日立製作所中央研究所内 Tokyo, 〒1858601, JP)

H01J27/26; H01J37/08; H01J37/09; H01J37/16; H01J37/18; H01J37/26

Polaire I.P.C. (7-1Hatchobori 2-chome, Chuo-ku Tokyo, 32, 〒1040032, JP)

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