Title:
ION BEAM DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/044429
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide an ion beam device with which it is possible to efficiently and accurately acquire information regarding the three-dimensional structure of a sample. The ion beam device according to the present invention comprises an ion source capable of generating a plurality of types of ion beams. By repeatedly shaving the sample surface uniformly in the thickness direction of the sample and observing the surface shape, the surface shape at each position in the thickness direction of the sample is obtained (see fig. 1).
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| WO/2014/178418 | LIQUID DROPLET INJECTING APPARATUS AND ION SOURCE |
| JPS6070699 | ION SOURCE DEVICE |
Inventors:
MATSUBARA SHINICHI (JP)
SHICHI HIROYASU (JP)
KURATA SAYAKA (JP)
IKOTA MASAMI (JP)
SHICHI HIROYASU (JP)
KURATA SAYAKA (JP)
IKOTA MASAMI (JP)
Application Number:
PCT/JP2018/031714
Publication Date:
March 05, 2020
Filing Date:
August 28, 2018
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/08; H01J37/28
Domestic Patent References:
| WO2011001797A1 | 2011-01-06 |
Foreign References:
| JP2010114082A | 2010-05-20 | |||
| JP2009517839A | 2009-04-30 | |||
| JP2015204181A | 2015-11-16 |
Attorney, Agent or Firm:
HIRAKI & ASSOCIATES (JP)
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