Title:
ION BEAM DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/053704
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide an ion beam device that can measure structures existing at different positions in the thickness direction of a sample. The ion beam device pertaining to the present invention irradiates a sample with ion beams in which elements contained in a gas have been ionized. After acquiring a first observation image of a first shape of a first region using a first ion beam, the ion beam device processes a hole in a second region of the sample using a second ion beam, and furthermore, acquires a second observation image of a second shape of the second region using the first ion beam on the processed hole. By comparing the first observation image and the second observation image, the relative positional relationship between the first shape and the second shape is acquired (see FIG. 7C).
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Inventors:
MATSUBARA SHINICHI (JP)
IKOTA MASAMI (JP)
IKOTA MASAMI (JP)
Application Number:
PCT/JP2019/036260
Publication Date:
March 25, 2021
Filing Date:
September 17, 2019
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/22; H01J37/317
Domestic Patent References:
| WO2009020150A1 | 2009-02-12 |
Foreign References:
| JP2015204181A | 2015-11-16 | |||
| JP2017021006A | 2017-01-26 | |||
| JP2011086606A | 2011-04-28 | |||
| JPS5146062A | 1976-04-20 | |||
| JP2005108100A | 2005-04-21 |
Attorney, Agent or Firm:
HIRAKI & ASSOCIATES (JP)
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