Title:
ION BEAM GENERATING APPARATUS, AND ION BEAM PLASMA PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2013/011657
Kind Code:
A1
Abstract:
Provided are: an ion beam generating apparatus, which is provided with a movable member (for instance, a plug (205)), and is capable of reducing formation of a film attached to a side wall (205b) of the member, even if an electrode of a grid assembly (203) is sputtered; and an ion beam plasma processing apparatus. An ion beam generating apparatus of one embodiment of the present invention is provided with: the grid assembly (203), which is provided to face an upper wall (201); the plug (205) that can move in the first direction directed toward the grid assembly (203) from the upper wall (201), and in the second direction directed toward the upper wall (201) from the grid assembly (203); and a shield (201C), which shields a side wall (205b) of the plug.
Inventors:
ABARRA EINSTEIN NOEL (JP)
KAMIYA YASUSHI (JP)
KONNO YUTA (JP)
KAMIYA YASUSHI (JP)
KONNO YUTA (JP)
Application Number:
PCT/JP2012/004450
Publication Date:
January 24, 2013
Filing Date:
July 10, 2012
Export Citation:
Assignee:
CANON ANELVA CORP (JP)
ABARRA EINSTEIN NOEL (JP)
KAMIYA YASUSHI (JP)
KONNO YUTA (JP)
ABARRA EINSTEIN NOEL (JP)
KAMIYA YASUSHI (JP)
KONNO YUTA (JP)
International Classes:
H01J37/08; H01J27/16; H01L21/302
Domestic Patent References:
| WO2007029777A1 | 2007-03-15 |
Foreign References:
| US20040163766A1 | 2004-08-26 | |||
| JPH0214517A | 1990-01-18 | |||
| JPH09245704A | 1997-09-19 | |||
| JP2002514747A | 2002-05-21 | |||
| JPH02183954A | 1990-07-18 | |||
| JP2006351374A | 2006-12-28 | |||
| JP2011124215A | 2011-06-23 | |||
| JPH06310065A | 1994-11-04 |
Attorney, Agent or Firm:
OKABE, Yuzuru et al. (JP)
Okabe 讓 (JP)
Okabe 讓 (JP)
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Claims:
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