Title:
ION IRRADIATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2010/029929
Kind Code:
A1
Abstract:
Provided is an ion irradiation device (10) wherein an intermediate electrode (24) having a voltage slightly lower than that of an ionizing chamber (31) is arranged between the ionizing chamber (31) and an extraction electrode (25), and the focal position of ion beams is brought closer to a first focusing device (26) by focusing the ion beams in the downstream of the intermediate electrode (24). Thus, since the ion beams are inputted to the first focusing device (26) before the ion beams greatly diffuse, the ion irradiation device having higher ion beam focusing performance is provided.
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Inventors:
KUNIBE Toshiju (INC. 2500, Hagisono, Chigasaki-sh, Kanagawa 43, 〒2538543, JP)
Application Number:
JP2009/065699
Publication Date:
March 18, 2010
Filing Date:
September 09, 2009
Export Citation:
Assignee:
ULVAC, INC. (2500, Hagisono Chigasaki-sh, Kanagawa 43, 〒2538543, JP)
株式会社アルバック (〒43 神奈川県茅ヶ崎市萩園２５００ Kanagawa, 〒2538543, JP)
株式会社アルバック (〒43 神奈川県茅ヶ崎市萩園２５００ Kanagawa, 〒2538543, JP)
International Classes:
H01J27/20; H01J27/02; H01J37/08; H01J37/305; H01J37/317
Attorney, Agent or Firm:
ISHIJIMA Shigeo et al. (Toranomonkougyou Bldg, 3F1-2-18, Toranomon, Minato-ku, Tokyo 01, 〒1050001, JP)
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