Title:
ION-MILLING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2018/003109
Kind Code:
A1
Abstract:
In ion-milling apparatuses of the prior art, it has not been necessary to consider variations in the radiation position of an ion beam caused by variations in an acceleration voltage, since it has been sufficient to adjust the acceleration voltage within a range of around 0-5 kV. However, recently, improvement of sample processing throughput has been demanded. Therefore, there is a problem in that it is necessary to increase the acceleration voltage, but variations in the radiation position of the ion beam caused by variations in the acceleration voltage become larger when the acceleration voltage is varied in the range of zero to several tens of kV, and it becomes difficult to perform processing in the same place. An ion-milling apparatus (101) of an embodiment of the present invention comprises: an ion source (1); an acceleration electrode (3) that accelerates ions radiated from the ion source at a prescribed voltage; and an adjusting unit (4, 12, 13) that adjusts the radiation position of an ion beam (2a-2c) on the basis of the prescribed voltage.
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Inventors:
IWAYA TORU (JP)
TAKASU HISAYUKI (JP)
KAMINO ATSUSHI (JP)
NARA DAICHI (JP)
TAKASU HISAYUKI (JP)
KAMINO ATSUSHI (JP)
NARA DAICHI (JP)
Application Number:
PCT/JP2016/069583
Publication Date:
January 04, 2018
Filing Date:
July 01, 2016
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/30
Domestic Patent References:
| WO2016017661A1 | 2016-02-04 |
Foreign References:
| JPS62160648A | 1987-07-16 | |||
| JP2015532709A | 2015-11-12 | |||
| JPH10321173A | 1998-12-04 | |||
| JP2007083262A | 2007-04-05 |
Attorney, Agent or Firm:
TODA Yuji (JP)
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