Title:
ION MILLING DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/157908
Kind Code:
A1
Abstract:
To increase processing reproducibility, an ion milling device 100 comprises a sample chamber 107, a sample stage 102 that is arranged inside the sample chamber and in which a sample is placed, an ion source 101 that emits unfocused ion beams toward the sample, a control unit 112 that controls the output of the ion beams, an oscillator 104 arranged inside the sample chamber, and an oscillation circuit 111 that oscillates an oscillator and outputs oscillation signals to the control unit. The control unit controls the output of the ion beams so that the vibration frequency change amount per unit of time of the oscillator due to sedimentation on the oscillator of sputtering particles generated by irradiating the sample with ion beams is kept within a predetermined range.
Inventors:
AIDA SHOTA (JP)
TAKASU HISAYUKI (JP)
KAMINO ATSUSHI (JP)
KAMOSHIDA HITOSHI (JP)
TAKASU HISAYUKI (JP)
KAMINO ATSUSHI (JP)
KAMOSHIDA HITOSHI (JP)
Application Number:
PCT/JP2021/002163
Publication Date:
July 28, 2022
Filing Date:
January 22, 2021
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/30
Foreign References:
| JPS6355535U | 1988-04-14 | |||
| JP2019510374A | 2019-04-11 | |||
| JP2006344745A | 2006-12-21 | |||
| JP2019137877A | 2019-08-22 | |||
| JP2007048588A | 2007-02-22 | |||
| JPH11160057A | 1999-06-18 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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