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Patent Searching and Data


Title:
ION REMOVAL SYSTEM
Document Type and Number:
WIPO Patent Application WO/2020/044694
Kind Code:
A1
Abstract:
An ion removal system according to the present invention is provided with: a primary-side ion removal device comprising a primary-side hard-water accommodation part that accommodates hard water, and a primary-side microbubble generation part that generates and supplies microbubbles to the primary-side hard-water accommodation part, first metal ions, contained in the hard water in the primary-side hard-water accommodation part, being adsorbed by the microbubbles and removed from the hard water; a secondary-side pH adjusting device that increase the pH of the hard water from which the first metal ions have been removed by the primary-side ion removal device; and a secondary-side ion removal device comprising a secondary-side hard-water accommodation part that accommodates the hard water the pH of which has been increased by the secondary-side pH adjusting device, and a secondary-side microbubble generation part that generates and supplies microbubbles to the secondary-side hard-water accommodation part, second metal ions, contained in the hard water in the secondary-side hard-water accommodation part, being adsorbed by the microbubbles and removed from the hard water.

Inventors:
TAKEHISA AYANE
MAEDA YASUNARI
AKITA TOMOHIRO
Application Number:
PCT/JP2019/021700
Publication Date:
March 05, 2020
Filing Date:
May 31, 2019
Export Citation:
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Assignee:
PANASONIC IP MAN CO LTD (JP)
International Classes:
C02F1/58; C02F1/20; C02F1/461
Domestic Patent References:
WO2018159693A12018-09-07
Foreign References:
JP2011161407A2011-08-25
JP2008006405A2008-01-17
JP2011056345A2011-03-24
JP2010091125A2010-04-22
JP2010078239A2010-04-08
JP2000140840A2000-05-23
Other References:
See also references of EP 3845499A4
Attorney, Agent or Firm:
YAMAO, Norihito et al. (JP)
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