Title:
ION SOURCE, MASS SPECTROMETER, ION SOURCE CONTROL METHOD
Document Type and Number:
WIPO Patent Application WO/2021/171725
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide an ion source which enables accurate, efficient ascertainment of whether or not the tip position of a capillary on the downstream side is appropriate, and a control method thereof. An ion source pertaining to the present invention measures a current generated by a voltage applied to a capillary by a power supply when a specimen is not introduced into the capillary, outputs exposure amount information indicating that an exposure amount of the capillary is appropriate if the current is within an allowable range, and outputs protrusion amount information indicating that a protrusion amount is inappropriate if the current is not within the allowable range.
Inventors:
HASEGAWA HIDEKI (JP)
SUGIYAMA MASUYUKI (JP)
HASHIMOTO YUICHIRO (JP)
SUGIYAMA MASUYUKI (JP)
HASHIMOTO YUICHIRO (JP)
Application Number:
PCT/JP2020/045196
Publication Date:
September 02, 2021
Filing Date:
December 04, 2020
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J49/04; G01N27/62; H01J49/16
Domestic Patent References:
| WO2019049271A1 | 2019-03-14 |
Foreign References:
| JPH10241626A | 1998-09-11 | |||
| US20050258360A1 | 2005-11-24 | |||
| US20060192108A1 | 2006-08-31 | |||
| JP2008021455A | 2008-01-31 | |||
| JP2008021455A | 2008-01-31 |
Other References:
See also references of EP 4113576A4
Attorney, Agent or Firm:
HIRAKI & ASSOCIATES (JP)
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