Title:
ION SOURCE
Document Type and Number:
WIPO Patent Application WO/2020/095611
Kind Code:
A1
Abstract:
The purpose of the present invention is to improve safety and stability of an ion source by uniformizing the temperature distribution across a heating gas while ensuring thermal insulation properties. The ion source according to the present invention is provided with a gas inlet port that is disposed within a probe holding part for holding an ion probe, wherein a plurality of mutually independent pipes extending along the extension direction of the ion probe are provided for connecting between the gas inlet part and a heating part for raising the temperature of the heating gas.
Inventors:
HASEGAWA HIDEKI (JP)
SUGIYAMA MASUYUKI (JP)
HASHIMOTO YUICHIRO (JP)
SUGIYAMA MASUYUKI (JP)
HASHIMOTO YUICHIRO (JP)
Application Number:
PCT/JP2019/039937
Publication Date:
May 14, 2020
Filing Date:
October 10, 2019
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J49/10
Foreign References:
| JP2004028763A | 2004-01-29 | |||
| JP2013190316A | 2013-09-26 | |||
| JP2003517576A | 2003-05-27 | |||
| JP2007066903A | 2007-03-15 | |||
| US20050258358A1 | 2005-11-24 | |||
| JPS6136773B2 | 1986-08-20 |
Other References:
See also references of EP 3879560A4
Attorney, Agent or Firm:
HIRAKI & ASSOCIATES (JP)
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