Title:
IRRADIATION SYSTEM AND IRRADIATION METHOD
Document Type and Number:
WIPO Patent Application WO/2019/016943
Kind Code:
A1
Abstract:
After a first lighting device (4a) has started irradiation of a light pattern A, a second lighting device (4b) starts irradiation of a light pattern B. An element that constitutes the light pattern B is disposed on the same straight line as an element that constitutes the light pattern A.
Inventors:
IMAISHI AKIKO (JP)
FUKUTAKA SHINSAKU (JP)
NISHIHIRA MUNETAKA (JP)
SAKATA REIKO (JP)
KASUGA KEI (JP)
MATSUBARA TSUTOMU (JP)
FUKUTAKA SHINSAKU (JP)
NISHIHIRA MUNETAKA (JP)
SAKATA REIKO (JP)
KASUGA KEI (JP)
MATSUBARA TSUTOMU (JP)
Application Number:
PCT/JP2017/026488
Publication Date:
January 24, 2019
Filing Date:
July 21, 2017
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP (JP)
International Classes:
B60Q1/26
Domestic Patent References:
| WO2016027315A1 | 2016-02-25 |
Foreign References:
| US20170166111A1 | 2017-06-15 |
Attorney, Agent or Firm:
TAZAWA, Hideaki et al. (JP)
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