IRREGULARLY-SHAPED SILICA-BASED FINE PARTICLE DISPERSION, METHOD FOR PRODUCING SAME, PARTICLE-LINKED SILICA FINE PARTICLE DISPERSION, METHOD FOR PRODUCING SAME, AND ABRASIVE GRAIN DISPERSION FOR POLISHING

Title:

Document Type and Number:

WIPO Patent Application WO/2022/123820

Kind Code:

A1

Abstract:

This method for producing an irregularly-shaped silica-based fine particle dispersion comprises the following steps (a) through (f). Step (a): a step for adjusting the ionic strength to 0.4 or higher in an alkali silicate aqueous solution to obtain a seed particle precursor dispersion. Step (b): a step for heating and ripening the seed particle precursor dispersion. Step (c): a step for adding an acidic silicic acid solution to the heated, ripened seed particle precursor dispersion to obtain a seed particle dispersion. Step (d): a step for adjusting the seed particle dispersion to an ionic strength of 0.25 or higher. Step (e): a step for heating and ripening the seed particle dispersion, for which the SiO2 concentration and ionic strength have been adjusted. Step (f): a step for adding an acidic silicic acid solution to the heated, ripened seed particle dispersion to obtain an irregularly-shaped silica-based fine particle dispersion containing irregularly-shaped silica-based fine particles.

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Inventors:

NAKAYAMA KAZUHIRO (JP)
YAMADA DAISUKE (JP)

Application Number:

PCT/JP2021/028293

Publication Date:

June 16, 2022

Filing Date:

July 30, 2021

Export Citation:

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Assignee:

JGC CATALYSTS & CHEMICALS LTD (JP)

International Classes:

C01B33/143; B24B37/00; C09K3/14; H01L21/304

Domestic Patent References:

WO2019131874A1	2019-07-04
WO2019163992A1	2019-08-29
WO2020179558A1	2020-09-10
WO2020075654A1	2020-04-16

Foreign References:

JP2017206410A	2017-11-24
JP2011104694A	2011-06-02
JP2007153692A	2007-06-21
JP2011098859A	2011-05-19

Attorney, Agent or Firm:

KINOSHITA & ASSOCIATES (JP)

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