Title:
ISOPROPYL 3-CHLORO-4-METHYLBENZOATE AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2013/015203
Kind Code:
A1
Abstract:
Provided is isopropyl 3-chloro-4-methylbenzoate, which is a novel substance that is useful as an intermediate for the synthesis of functional polymer materials, agrichemicals, pharmaceuticals, and the like. Also provided is a method for producing the same. Isopropyl 3-chloro-4-methylbenzoate represented by formula (1) is produced by the method whereby 4-chloro-methylbenzoic acid chloride is subjected to nuclear chlorination in the presence of chlorine and a Lewis acid catalyst, the resulting 3-chloro-4-methylbenzoic acid chloride is esterified by isopropyl alcohol, and isopropyl 3-chloro-4-methylbenzoate is produced.
Inventors:
KATO TOMOKI (JP)
KAI RYOTA (JP)
KOBAYASHI YUKIMOTO (JP)
KAI RYOTA (JP)
KOBAYASHI YUKIMOTO (JP)
Application Number:
PCT/JP2012/068409
Publication Date:
January 31, 2013
Filing Date:
July 20, 2012
Export Citation:
Assignee:
NIPPON LIGHT METAL CO (JP)
TORAY FINECHEMICALS CO LTD (JP)
KATO TOMOKI (JP)
KAI RYOTA (JP)
KOBAYASHI YUKIMOTO (JP)
TORAY FINECHEMICALS CO LTD (JP)
KATO TOMOKI (JP)
KAI RYOTA (JP)
KOBAYASHI YUKIMOTO (JP)
International Classes:
C07C69/76; C07C67/14; C07B61/00
Domestic Patent References:
WO2010007964A1 | 2010-01-21 | |||
WO2003095417A1 | 2003-11-20 |
Foreign References:
JPH07330663A | 1995-12-19 | |||
CN1762970A | 2006-04-26 | |||
JP2009512651A | 2009-03-26 | |||
JP2006506340A | 2006-02-23 | |||
JPS60208966A | 1985-10-21 | |||
US20020099212A1 | 2002-07-25 |
Other References:
DATABASE CA V.,A.K. ET AL.: "Determination of the configuration of stereoisomeric ethylene derivatives, Zeitschrift fuer Physikalische Chemie, Abteilung A: Chemische Thermodynamik, Kinetik, Elektrochemie", XP003027742, accession no. 930:19650
Attorney, Agent or Firm:
SASAKI Kazuya et al. (JP)
Kazuya Sasaki (JP)
Kazuya Sasaki (JP)
Download PDF:
Claims:
Previous Patent: FLUORINE-CONTAINING COPOLYMER COMPOSITION
Next Patent: SEMICONDUCTOR INSPECTING SYSTEM
Next Patent: SEMICONDUCTOR INSPECTING SYSTEM