KIT FOR PREPARING SKIN CLEANSING COMPOSITION, SKIN CLEANSING COMPOSITION, AND METHOD FOR PREPARING SKIN CLEANSING COMPOSITION

WIPO Patent Application WO/2014/204019

A3

The purpose of the present disclosure is to provide a kit for preparing a skin cleansing composition that is less susceptible to cloudiness and precipitation. A kit according to the present disclosure has the following configuration. A kit for preparing a skin cleansing composition, said kit comprising an A agent, a B agent, and a C agent, and characterized in that the A agent is an aqueous solution including an (a1) polycationic antimicrobial agent and an (a2) chelating compound, the B agent is an aqueous solution including a (b1) non-ionic surfactant and a (b2) polyhydric alcohol, and the C agent includes a (c1) preservative.

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MANABE RIKA (JP)
MIYAKE DAISUKE (JP)
BANDOU TAKESHI (JP)
SANKODA CHIHO (JP)

PCT/JP2014/072501

March 12, 2015

August 27, 2014

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UNICHARM CORP (JP)

A61K8/84; A61K8/34; A61K8/365; A61K8/368; A61K8/86; A61Q19/10; C11D1/66; C11D3/20; C11D3/48; C11D3/50; C11D17/00; C11D17/08

WO2011013494A1

2011-02-03

JPH0261000A	1990-03-01
JP2013151447A	2013-08-08
JP2013129611A	2013-07-04
JP2008295837A	2008-12-11
JP2006340949A	2006-12-21
JP2014070044A	2014-04-21

AOKI, Atsushi et al. (Toranomon 37 Mori Bldg. 5-1, Toranomon 3-chome, Minato-k, Tokyo 23, JP)

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