LARGE GLASS SUBSTRATE FOR PHOTOMASK AND METHOD FOR PRODUCING SAME, COMPUTER READABLE RECORDING MEDIUM, AND METHOD FOR EXPOSING MOTHER GLASS

Title:

LARGE GLASS SUBSTRATE FOR PHOTOMASK AND METHOD FOR PRODUCING SAME, COMPUTER READABLE RECORDING MEDIUM, AND METHOD FOR EXPOSING MOTHER GLASS

Document Type and Number:

WIPO Patent Application WO/2006/134855

Kind Code:

A1

Abstract:

A large glass substrate for reducing variation in proximity gap between a mother glass, i.e. an exposure object and a photomask substrate when the photomask substrate formed of a large glass substrate is subjected to proximity exposure while being supported horizontally in an exposure device. In planalization of the large glass substrate, planarization removing amount obtained under a state held vertical is corrected by deformation correction machining removing amount calculated from the self-weight flexure quantity of the large glass substrate, the quantity of deformation caused by being supported in an exposure device, and precision distortion of a lapping plate supporting the mother glass, thus obtaining a large glass substrate having an arcuate cross-section with a recessed surface on the side opposing the mother glass when being held vertically. When the inventive large glass substrate is employed in a photomask, exposure precision, especially, overlap precision and resolution are enhanced, even a high definition large panel can be exposed, and the yield of panel is enhanced by lessening burden of exposure correction.

Inventors:

UEDA SHUHEI (JP)
SHIBANO YUKIO (JP)
WATABE ATSUSHI (JP)
KUSABIRAKI DAISUKE (JP)

Application Number:

PCT/JP2006/311723

Publication Date:

December 21, 2006

Filing Date:

June 12, 2006

Export Citation:

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Assignee:

SHINETSU CHEMICAL CO (JP)
UEDA SHUHEI (JP)
SHIBANO YUKIO (JP)
WATABE ATSUSHI (JP)
KUSABIRAKI DAISUKE (JP)

International Classes:

C03C19/00; G03F1/60; G03F1/68; H01L21/027

Foreign References:

JP2003292346A	2003-10-15
JP2002318450A	2002-10-31
JP2003186199A	2003-07-03
EP1333313A1	2003-08-06
JP2003292346A	2003-10-15
JP2004359544A	2004-12-24

Other References: