Title:
LASER ANNEALING DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/184153
Kind Code:
A1
Abstract:
This laser annealing device is provided with: a pulsed laser generating unit 12 which radiates a pulsed laser light beam as a first laser light beam L1 having a uniform luminance distribution; a continuous wave laser generating unit 13 which causes a continuous wave laser light beam to oscillate as a second laser light beam L2; and a laser beam radiating unit 20 which splits a plurality of first laser light beams L1 from one first laser light beam L1, and causes the second laser light beam L2 to be radiated with a prescribed radiation shape onto a substrate 1 being processed.
Inventors:
MIZUMURA MICHINOBU (JP)
SHIOAKU YOSHIHIRO (JP)
SHIOAKU YOSHIHIRO (JP)
Application Number:
PCT/JP2020/007185
Publication Date:
September 17, 2020
Filing Date:
February 21, 2020
Export Citation:
Assignee:
V TECH CO LTD (JP)
International Classes:
H01L21/20; H01L21/268; H01L21/336; H01L29/786
Domestic Patent References:
| WO2018158648A1 | 2018-09-07 |
Foreign References:
| JP2006156676A | 2006-06-15 | |||
| JP2003151904A | 2003-05-23 |
Attorney, Agent or Firm:
NISSAY INTERNATIONAL PATENT OFFICE (JP)
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